Metal Plating
Monitor major and minor plating bath elements simultaneously to improve product quality
Robust monitoring of plating baths for optimal performance
- Simultaneous measurement of major bath components and potential contamination elements
- Reduced operational costs with robust N₂ plasma
- Increased operational uptime
- Simple operation – easy to train additional operators
Features & Benefits
What can our instruments do for you?
- Use robust nitrogen plasma with superior matrix tolerance.
- Simultaneous measurement for fast analysis times.
- Smallest footprint and light-weight design.
- Reduced running cost/analysis.
- Easy-to-use Windows-based graphical user interface of RIS software package.
- The ability to display, store and recall spectra for every sample analyzed data display and reprocessing, without the need to rerun samples (original data is unchanged).
- Automated robust wavelength accuracy algorithm to ensure wavelength stability for extended sample runs.
